A5028000462- Parallel Computing and Optimization Techniques
- Industrial Vision Systems and Defect Detection
- Advancements in Photolithography Techniques
- Distributed and Parallel Computing Systems
- Climate Change and Sustainable Development
- Embedded Systems Design Techniques
- Climate Change and Geoengineering
- Advanced Surface Polishing Techniques
- Maritime Security and History
- Synthesis and biological activity
- Genomics, phytochemicals, and oxidative stress
- Computer Graphics and Visualization Techniques
- Scientific Computing and Data Management
- Metabolomics and Mass Spectrometry Studies
- Environmental Impact and Sustainability
Samsung (South Korea)
2014-2022
Gwangju Institute of Science and Technology
2017
Victoria University of Wellington
2010
Building Research Association of New Zealand
2010
Wrightington, Wigan and Leigh NHS Foundation Trust
2010
For the era of multi-beam mask writer, in 2019 BACUS conference, we proposed formation a data format working group to address need for curvilinear representation. The new was formed October driven by major semiconductor companies with representations from Mentor, Synopsys, Nippon Control Systems, D2S, Aselta, and ASML-BRION initial goals quantify volume problem; develop, test implement or revised formats based on OASIS; formalize as SEMI task force (TF). In this paper, necessity progress our...
Inverse lithography technology (ILT) optical proximity correction is going to play a critical role in addressing challenges of and EUV as the industry pushes toward advanced nodes. One major barrier adoption ILT has been mask writer's inability efficiently write curvilinear patterns. With introduction multibeam writers, this removed widespread imminent. Traditionally, writers have accepted only trapezoidal inputs tool, though recent trends show that are adopting newer formats already reduce...
Multi-beam mask writers (MBMW) offer the potential to enable use of ideal curvilinear shapes for ILT masks, but current layout formats are not sufficient represent complex designs efficiently from OPC through making. In 2019 BACUS conference, we proposed formation a data format working group address need representation MBMW. The Curvilinear was first initiated in October with participation EDA companies and advanced makers. this paper, necessity new our will be introduced. We discuss...