Won-Chul Lee

ORCID: 0000-0001-8253-0010
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About
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Research Areas
  • Semiconductor materials and devices
  • Laser-induced spectroscopy and plasma
  • Ferroelectric and Negative Capacitance Devices
  • Laser Design and Applications
  • Interconnection Networks and Systems
  • Parallel Computing and Optimization Techniques
  • Plasma Diagnostics and Applications
  • Photonic and Optical Devices
  • Advanced Memory and Neural Computing
  • Low-power high-performance VLSI design
  • 3D IC and TSV technologies
  • Microwave Engineering and Waveguides
  • Photovoltaic System Optimization Techniques
  • Manufacturing Process and Optimization
  • Gold and Silver Nanoparticles Synthesis and Applications
  • Spectroscopy Techniques in Biomedical and Chemical Research
  • Dust and Plasma Wave Phenomena
  • Thin-Film Transistor Technologies
  • Advanced Data Storage Technologies
  • Machine Learning and ELM
  • Organic Electronics and Photovoltaics
  • Electronic Packaging and Soldering Technologies
  • Algorithms and Data Compression
  • Energetic Materials and Combustion
  • Heat Transfer and Optimization

National NanoFab Center
2023-2024

Chungnam National University
2023

Korea Institute of Materials Science
2021

Korea Electronics Technology Institute
2017

Kyung Hee University
2014

Chungbuk National University
2003-2008

The Ohio State University
1999-2003

Kyungil University
2003

Abstract In this study, we developed the CMOS process-compatible Ta2O5-based ReRAM with improved uniformity through 6% nitrogen (N) doping. The N-doped TaOX layer, acting as an oxygen reservoir, helped control stochastic behavior of conductive filaments. As a result, device showed 42% and 46% reduction in current variation for low resistance state (LRS) high (HRS), respectively, compared to undoped device. Additionally, set voltage (VSET) decreased by 50%, marking significant improvement...

10.35848/1347-4065/adb160 article EN Japanese Journal of Applied Physics 2025-02-03

In this letter, a new low-loss and low-cost through silicon via (TSV) process is presented. The proposed silicon-core coaxial (S-COV) very simple time-saving compared with conventional TSV. structure, metal-coated silicon-pole used as vertical interconnect instead of fully filled metal via. depth the fabricated S-COV 120 μm minimum diameter signal core dielectric gap to ground are 40 20 μm, respectively. well-matched condition, measured insertion loss single 0.053 dB at 10 GHz.

10.1109/lmwc.2017.2690826 article EN IEEE Microwave and Wireless Components Letters 2017-04-25

1 Gbit SOI DRAM with a body-contacted (BC) MOSFET structure is successfully realized for the first time. The fabricated 1G has fully compatible process 0.17 /spl mu/m bulk CMOS technology except isolation process. key advantage of BC-SOI freedom from floating-body effect, since body-potential increase can be suppressed by well contact through remaining thin-silicon film beneath field oxide. several advantages, such as relatively high punchthrough voltage, drain-to-source breakdown voltage...

10.1109/iedm.1997.650451 article EN 2002-11-23

Asynchronous design methods are known to have higher performance in power consumption and execution speed than synchronous ones because they just needs activate the required module without feeding clock entire system. In this paper, we propose an asynchronous processor, A8051, compatible with Intel 8051, which is a challenge for pipelined CISC type microcontroller. The A8051 has special features such as optimal instruction scheme that eliminates bubble state, variable length handling...

10.1109/mwscas.2002.1186952 article EN 2003-10-01

BCH (Bose-Chaudhuri-Hocquenghem) coding is very useful to correct a small bit error. But the code length n longer such as game program stored in MLC (multi-level cell) flash memory, decoding circuits takes lot of computation time. This paper presents parallel architecture aiming speed up that guarantees 2-bit error correction. It allows one word data can be fed into decoder at time and decoded parallel. The experimental results show proposed (4122, 4096, 2) runs about 7.5 times faster than...

10.1109/socdc.2008.4815742 article EN International SoC Design Conference 2008-11-01

In this article, we have demonstrated a simple 200-mm Si CMOS process-based integrated passive device (IPD) stack for millimeter-wave (mmW) monolithic 3-D (M3D) integration. By developing double chemical mechanical polishing (CMP) technique the final intermetal dielectric (IMD) process, an rms value of less than 1 nm top-surface roughness IPD was achieved, resulting in uniform integration 100-nm-thick active layer InGaAs high-electron-mobility transistor (HEMT) on stack. The included...

10.1109/ted.2023.3302817 article EN IEEE Transactions on Electron Devices 2023-08-15

10.7567/ssdm.2024.ps-02-23 article EN Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials 2024-09-03

Typical trouble patterns in solar thermal systems include working fluid leakage and freezing other than breakdown of pump. A sensor for measuring electric resistance was developed installed at the top collector piping order to check fault system. Working level pipe determined by from a sensor. On base this, it confirmed that diagnoses fluid. Electric propylene glycol aqueous solution measured range <TEX>$0{\sim}70^{\circ}C$</TEX> 0~40% concentration. The response surface analysis performed...

10.6110/kjacr.2014.26.8.351 article EN Korean Journal of Air-Conditioning and Refrigeration Engineering 2014-08-10

In this paper, we present a new mixture RZ/NRZ dual-rail transmission method to reduce the power consumption associated with data switching and overcome zero overhead of RZ decoding scheme. The encoding is useful detect completion signal each module in asynchronous circuits using DI delay model. However, scheme gives some disadvantages, large chip area higher than single-rail counterparts. proposed reduces activities circuit significantly introducing NRZ on one rail, which leads lower...

10.1109/apasic.2004.1349468 article EN Proceedings of 2004 IEEE Asia-Pacific Conference on Advanced System Integrated Circuits 2004-10-26

10.1615/ihtc15.evp.008652 article EN Proceedings of the 15th International Heat Transfer Conference 2014-01-01
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