A5076640215- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Plasma Applications and Diagnostics
- Copper Interconnects and Reliability
- Diamond and Carbon-based Materials Research
- Metal and Thin Film Mechanics
- Ion-surface interactions and analysis
- Surface Modification and Superhydrophobicity
- Catalytic Processes in Materials Science
- Advanced Sensor and Energy Harvesting Materials
- Gas Sensing Nanomaterials and Sensors
- Silicone and Siloxane Chemistry
- Polymer crystallization and properties
- ZnO doping and properties
- X-ray Diffraction in Crystallography
- Molecular Junctions and Nanostructures
- Muon and positron interactions and applications
- Crystallization and Solubility Studies
- Electronic and Structural Properties of Oxides
- Gyrotron and Vacuum Electronics Research
- Organic Light-Emitting Diodes Research
- Advanced Surface Polishing Techniques
- Synthesis and properties of polymers
- Electrohydrodynamics and Fluid Dynamics
- Advanced Fiber Optic Sensors
Ruhr University Bochum
2013-2022
RWTH Aachen University
2019
General Electric (Germany)
2016
A study on the plasma-enhanced atomic layer deposition of amorphous inorganic oxides SiO2 and Al2O3 polypropylene (PP) was carried out with respect to growth taking place at interface polymer substrate thin film employing in situ quartz-crystal microbalance (QCM) experiments. model spin-coated PP (scPP) deposited QCM crystals prior depositions allow a transfer findings from studies industrially applied foil. The influence precursor choice (trimethylaluminum (TMA) vs...
The identification of bis-3-(N,N-dimethylamino)propyl zinc ([Zn(DMP)2 ], BDMPZ) as a safe and potential alternative to the highly pyrophoric diethyl (DEZ) atomic layer deposition (ALD) precursor for ZnO thin films is reported. Owing intramolecular stabilization, BDMPZ thermally stable, volatile, nonpyrophoric solid compound, however, it possesses high reactivity due presence Zn-C Zn-N bonds in this complex. Employing precursor, new oxygen plasma enhanced (PE)ALD process temperature range 60...
Optical emission spectroscopy (OES) and multipole resonance probe (MRP) are adopted to characterize low-pressure microwave (MW) radio frequency (RF) discharges in oxygen. In this context, both usually applied for the deposition of permeation barrier SiOx films on plastic foils or inner surface bottles. For technological reasons MW excitation is modulated a continuous wave (cw) RF bias used. The voltage produces stationary low-density plasma, whereas high-density discharge pulsed....
The influence of ultraviolet (UV) radiation from oxygen and argon pretreatment plasmas on a plastic substrate has not been fully understood yet. In particular, its the adhesion properties sufficiently researched so far. This paper addresses this issue by comparing bond strength plasmapolymerized silicon organic coating (SiOxCyHz) polypropylene (PP) after plasma UV emitted same plasmas. is isolated other species means magnesium fluoride (MgF2) optical filter. It could be shown that...
A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin films as gas barrier layers on polymer substrates.
Due to their macromolecular structure, plastics are limited in scope of application whenever high barrier functionality against oxygen and water vapour permeation is required. One solution the deposition thin silicon oxide coatings plasma-enhanced chemical (PECVD) processes. A way improve performance use multilayer structures built from dyad layers, which combine an inorganic layer organic intermediate layer. In order investigate influence type number dyads on coated 23 µm PET films,...
Ultraviolet (UV) and vacuum ultraviolet (VUV) spectral irradiance is determined in low-pressure microwave-produced plasma, which regularly used for polymer surface treatment. The re-emitted fluorescence the UV/VIS range from a sodium salicylate layer measured. This related to VUV/UV radiation different bands based on cut-off filters. background produced by direct emitted region quantified using specific filter, thus enabling use of whole range. A novel procedure applied determine absolute...
Atomic oxygen densities and fluences in a microwave plasma are determined by means of optical emission spectroscopy for different to hexamethyldisiloxane (HMDSO) ratios during deposition SiO x C y H z like coatings on molecularly defined organic surfaces. The deposited octadecanethiol self‐assembled monolayers that serve as sensor layer. They used tracing the interfacial changes induced function O 2 HMDSO ratio absolutely quantified atomic fluence. chemical monitored polarization modulation...
Interfacial processes during the initial stages of SiOx-like plasma-polymer barrier coating deposition were investigated by means polarization modulation infrared reflection-absorption spectroscopy, and resulting effect on defect densities studied cyclic voltammetry. Octadecanethiol self-assembled monolayers Au-film coated wafers served as sensor layers to investigate interface chemistry plasma deposition. Both spectroscopic electrochemical data revealed that a thin SiOCH interlayer could...
Abstract A microwave induced coaxial surface wave discharge with a feeding gas mixture of oxygen and hexamethyldisiloxane used for the deposition polymer coatings is numerically analysed by volume-averaged zero-dimensional modelling formalism. set edge-to-centre ratios are analytically estimated self-consistent description positive ion reactive neutral flux at radial walls (Kemaneci et al 2017 J. Phys. D: Appl. 50 245203). The simulation results compared measurements wide variety distinct...
Abstract Identification and synthesis of intramolecularly donor‐stabilized aluminium(III) complexes, which contain a 3‐(dimethylamino)propyl (DMP) ligand, as novel atomic layer deposition (ALD) precursors has enabled the development new promising ALD processes for Al 2 O 3 thin films at low temperatures. Key this outcome is nature ligand combination that leads to heteroleptic complexes encompassing optimal volatility, thermal stability reactivity. The first ever example application family...
A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and atomic layer (PEALD) is presented. Thin films SiO x C y H z obtained from PECVD were grown either subsequently a PEALD seeding (SiO 2 ) or capped ultrathin Al O 3 . To study the impact overall GBL performance, coatings with high macro defect densities low efficiency regard oxygen transmission rate (OTR) chosen. demonstrated...
The adhesion of thin CVD films on polyolefins is often critical due to the low surface free energy polymers. In this study, injection moulded PP samples are produced and investigated. treated in very well-characterized pulsed plasmas before a HMDSO-based coating applied. resulting bond strength analyzed using pull-off tests. fractured interfaces characterized with XPS. Oxygen argon plasma pre-treatments result improvement by factor about 2. Comparing oxygen at equal ion fluences surface, it...
The growth rate during high-power pulsed magnetron sputtering (HIPIMS) of titanium is measured with a temporal resolution up to 25 µs using rotating shutter concept. According that concept 200 µm slit rotated in front the substrate synchronous HIPIMS pulses. Thereby, flux laterally distributed over substrate. By measuring resulting deposition profile profilometry, variation per pulse deduced. time-resolved rates are for 0.25, 0.5 and 1 Pa lengths 50, 400 an average power 100 W. We can...
Oxygen and water vapour permeation through plastic films in food packaging or other applications with high demands on are prevented by inorganic barrier films. Most of the occurs small defects (<3 µm) coating. The were visualized etching reactive oxygen a capacitively coupled plasma subsequent SEM imaging. In this work, SiO x -coatings deposited plasma-enhanced chemical deposition polyethylene terephthalate (PET) investigated mass transport polymer is simulated 3D approach. Calculations...
A volume-averaged global model is developed to investigate surface-wave discharges inside either cylindrical or coaxial structures. The neutral and ion wall flux self-consistently estimated based on a simplified analytical description both for electropositive electronegative plasmas. simulation results are compared with experimental data from various discharge setups of argon oxygen, measured obtained literature, continuous pulse-modulated power input. good agreement observed between the...
Defects in SiO x , TiO2 and a-Si:H inorganic barrier films on PET are investigated. Visualization is achieved by reactive oxygen etching capacitively coupled plasma that leads to the undercutting of at defect sites, densities deduced SEM imaging. Defect formation analyzed as a function absolutely quantified steady state atomic fluence during deposition silicon oxide effect an additional substrate bias presented. Macro-defect film thickness tracked. Barrier with improvement one order...
New precursor chemistries for the atomic layer deposition (ALD) of aluminium oxide are reported as potential alternatives to pyrophoric trimethylaluminium (TMA) which is date a widely used Al precursor. Combining high reactivity alkyls employing 3-(dimethylamino)propyl (DMP) ligand with thermally stable amide ligands yielded three new heteroleptic, non-pyrophoric compounds [Al(NMe2 )2 (DMP)] (2), [Al(NEt2 (3, BDEADA) and [Al(NiPr2 (4), combine properties both systems. The were synthesized...
Gas transport mechanisms through plastics are usually described by the temperature-dependent Arrhenius-model and compositions of several plastic layers represented CLT. When it comes to thin films such as plasma-enhanced chemical vapour deposition (PE-CVD) or atomic layer (PE-ALD) coatings on substrates polymeric material, a universal model is lacking. While existing models describe diffusion defects, these presume that permeation does not occur other means mechanisms. This paper correlates...
Low-pressure microwave discharges containing hexamethyldisiloxane (HMDSO) with admixtures of oxygen and nitrogen, used for the deposition silicon films, have been studied spectroscopically. Optical emission spectroscopy (OES) in visible spectral range has combined infrared laser absorption (IRLAS). The experiments were carried out order to analyze dependence plasma chemical phenomena on power gas mixture at relatively low pressures, up 50 Pa, values, 2 kW. evolution concentration methyl...