A5007589519- Block Copolymer Self-Assembly
- Advanced Polymer Synthesis and Characterization
- Model Reduction and Neural Networks
- Organic Electronics and Photovoltaics
- Thin-Film Transistor Technologies
- Advancements in Photolithography Techniques
- Conducting polymers and applications
- Polymer Surface Interaction Studies
Seoul National University
2022-2025
IMEC
2024
Continuous scaling by extreme ultraviolet (EUV) lithography is tightening the patterning requirements for photoresist materials. Specifically, chemically amplified resists (CAR) are facing significant challenges to keep supporting needs. In view of this, complementing EUV with directed self-assembly (DSA) block copolymers offers interesting opportunities enable use CAR towards ultimate resolution. As DSA decouples resist performance from final pattern quality, roughness and defects in can be...
Physical vapor deposition is widely used in the fabrication of organic light-emitting diodes and has potential to adjust density orientation through substrate temperature control, which may lead enhanced electrical performance. However, it unclear whether this property because horizontal molecular or increased density. The effects on properties a electron transport material, (3-dibenzo[c,h]acridin-7-yl)phenyl)diphenylphosphine oxide (TPPO-dibenzacridine), were investigated. According...
Abstract A requisite for successful nanopatterning is a precise interface control to meet the adequate surface energies. In block copolymer (BCP) nanopatterning, interfaces need be neutralized, promoting both blocks wet substrate, and thus realizing perpendicular orientation of BCPs. However, conventional methods neutralization are expensive require complex multi‐step processes, which hinders application BCP continuous lithography processes. this study, simplest method controlling...