Ruichen Zhao

ORCID: 0000-0003-3961-968X
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About
Contact & Profiles
Research Areas
  • Surface and Thin Film Phenomena
  • Advancements in Semiconductor Devices and Circuit Design
  • Semiconductor materials and devices
  • Quantum and electron transport phenomena

National Institute of Standards and Technology
2022

University of Colorado Boulder
2022

A merged-element transmon (MET) device based on silicon (Si) fins is proposed, and the first steps to form such a “FinMET” are demonstrated. This new application of fin technology capitalizes anisotropic etch Si(111) relative Si(110) define atomically flat, high aspect ratio Si tunnel barriers with epitaxial superconductor contacts parallel sidewall surfaces. process circumvents challenges associated growth low-loss insulating lattice matched superconductors. By implementing low-loss,...

10.1063/5.0104950 article EN publisher-specific-oa Applied Physics Letters 2022-08-08
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