Boxu Xu

ORCID: 0000-0003-4220-4127
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About
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Research Areas
  • Luminescence Properties of Advanced Materials
  • Luminescence and Fluorescent Materials
  • Perovskite Materials and Applications
  • Solid State Laser Technologies
  • ZnO doping and properties
  • Ga2O3 and related materials
  • Thin-Film Transistor Technologies
  • Silicon Nanostructures and Photoluminescence
  • Gas Sensing Nanomaterials and Sensors
  • Radiation Detection and Scintillator Technologies
  • Nanowire Synthesis and Applications
  • Terahertz technology and applications
  • Glass properties and applications
  • Photorefractive and Nonlinear Optics

University of Science and Technology Liaoning
2024

Shenzhen University
2020-2023

Hanshan Normal University
2020-2023

Tiangong University
2016-2019

In this paper, a series of Rb+-doped Er3+/Yb3+–Y2O3 films were synthesized via sol-gel method and spin coating. The structure morphology the samples investigated by X-ray diffraction scanning electron microscopy. with nanoparticles, in size range 20–40 nm, obtained. spectroscopic analysis was using emission spectra intensity luminescence. All exhibited green ascribed to 2H11/2/4S3/2 4I15/2 Er3+ red one 4F9/2 its stark level Er3+. As Rb+ concentration increased, intensities light enhanced...

10.3390/coatings10111137 article EN Coatings 2020-11-23

In this study, a series of well-crystallized Yb3+/Er3+/Tm3+-tridoped Y2O3-ZnO ceramic nano-phosphors were prepared using sol-gel synthesis, and the phosphor structures studied X-ray diffraction, scanning electron microscopy, thermogravimetric analysis. The phosphors well crystallized exhibited sharp-edged angular crystal structure mesoporous consisting 270 nm nano-particles. All generated blue, green, red emission bands attributed to Tm: 1G4→3H6, Er: 2H11/2 (4S3/2)→4I15/2, 4F9/2→4I15/2...

10.3390/nano12122107 article EN cc-by Nanomaterials 2022-06-19

P-doped silicon nanocrystals with an average diameter of 2–3 nm are formed by using KrF pulsed excimer laser irradiation method. The dark conductivity as high 25.7 S cm −1 can be obtained in nc-Si films after irradiation.

10.1039/d4ra00040d article EN cc-by-nc RSC Advances 2024-01-01
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