T. H. Darma

ORCID: 0009-0008-6885-4914
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Research Areas
  • ZnO doping and properties
  • Copper-based nanomaterials and applications
  • Characterization and Applications of Magnetic Nanoparticles
  • Advanced battery technologies research
  • Theoretical and Computational Physics
  • Advanced Memory and Neural Computing
  • Advanced oxidation water treatment
  • Surface and Thin Film Phenomena
  • Electrocatalysts for Energy Conversion
  • Gas Sensing Nanomaterials and Sensors
  • Electronic and Structural Properties of Oxides

The University of Sydney
2023

University of the West of Scotland
2011-2021

Bayero University Kano
2017

Scottish Universities Physics Alliance
2011

The achievement of a reproducible and controlled deposition partitioned Cu2O/CuO thin films by techniques compatible with ULSI processing like reactive magnetron sputtering has been reported as an outstanding challenge in the literature. This phase partitioning underlies their performance reversible resistive memory switching devices advanced microelectronic applications future. They are currently fabricated thermal oxidation chemical methods. We have used combination understanding from...

10.1063/1.4804326 article EN Journal of Applied Physics 2013-05-13

Clean hydrogen production via methane pyrolysis (CH4 → 2H2 + C) generates large quantities of solid carbon. Realizing their applications is a critical gap to enable its broader adoption. Here, we show that carbon nano onions encapsulated with iron cores (Fe@CNO) produced in CH4 using low-cost Fe ore catalysts can serve as tri-functional adsorbent and catalyst for organic contaminant degradation. Fe@CNO has high adsorption capacity fast pseudo-second-order kinetics antibiotics wastewater....

10.1016/j.apcatb.2023.123380 article EN cc-by-nc-nd Applied Catalysis B Environment and Energy 2023-10-18

<title/>Copper oxide thin films produced by rf magnetron sputtering on glass substrates have been characterised XRD, SEM, AFM, spectrophotometer and four-point probe measurements. It is shown that process parameters can be varied to produce of varying compositions, optical electrical properties. Depositions at 200 W power an oxygen flowrate 2 sccm in particular are found favour the formation single phase cuprous oxide. The properties prepared under stated conditions potential interest for...

10.1179/175355511x12941605982226 article EN Materials Technology 2011-02-01

Abstract Copper oxide films hold substantial promise as anti-stiction coatings in micro-electromechanical (MEMS) devices and with shrinking dimensions on the nanometre scale nano electromechanical (NEMS) devices. The Hamaker constant will play a very significant role understanding stiction tribology these We used an approximate but sufficiently accurate form of Lifshitz theory using multiple oscillator model to calculate Hamakers symmetric copper thin based experimentally obtained dielectric...

10.1038/s41598-021-83653-8 article EN cc-by Scientific Reports 2021-02-19

The search for p-type Transparent Conducting Oxides (TCO) has been pursued vigorously to complement current advances in n-type TCOs develop heterojunctions various electronic devices.One of the promising is CuAlO 2 .Thin ilms were deposited on a clean glass substrate using chemical solution deposition (sol-gel) method with CuCl and AlCl3 taken as starting materials.CuCl was dissolved HCl while distilled water, pH value mixture controlled by addition NaOH.The samples annealed at different...

10.20474/japs-3.1.3 article EN Journal of Applied and Physical Sciences 2017-02-12
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