Non‐Porous Low‐k Dielectric Films Based on a New Structural Amorphous Fluoropolymer

• DOI: 10.1002/adma.201302021
• Publication Date: 2013-07-15T11:46:53Z
• Authors: Chao Yuan; Kaikai Jin; Kai Li; Shen Diao; Jiawei Tong; Qiang Fang
• Keywords: Fluoropolymer; Thermostability

A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 loss less than 1.2 × 10−3 is reported here. also exhibits good mechanical properties high thermostability. This study a new example fully dense material showing k value having thermo/mechanical properties. As service to our authors readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed may be re-organized for online delivery, but not copy-edited or typeset. Technical support issues arising from (other missing files) should addressed Please note: The publisher responsible content functionality any Any queries content) directed corresponding author article.