Self‐Anchored Van‐Der‐Waals Stacking Growth of Transition‐Metal Dichalcogenide Nanoplates

• DOI: 10.1002/adma.202407586
• Publication Date: 2024-08-10T04:59:55Z
• Authors: Dingding Jiang; Ya‐Nan Tang; Di Wang; Xiangpeng Xu; Jiang Sun; Rong Ma; Wenhao Li; Zhiya Han; Yunqi Liu; Dacheng Wei
• Keywords: Nanometre

Transition-metal dichalcogenide (TMDs) nanoplates exhibit unique properties different from their monolayer counterparts. Controllable nucleation and growth are prerequisite highly desirable for practical applications. Here, a self-anchored van-der-Waals stacking method is developed, by which the substrate pit induced precursor etching anchors source material, impedes lateral spreading of droplets facilitates in situ high-quality TMD with thickness tens to hundreds nanometers at well-defined locations. As such, an array controlled dimensions produced applied arrayed photodetectors. This study solves problem controllable preparation nanoplates, holding promise applications electronics optoelectronics.