Large‐Area Low‐Cost Dielectric Perfect Absorber by One‐Step Sputtering

• DOI: 10.1002/adom.201801596
• Publication Date: 2019-03-04T08:54:22Z
• Authors: Shaowei Wang; Feiliang Chen; Ruonan Ji; Mingming Hou; Fei Yi; Weibo Zheng; Tao Zhang; Wei Lu
• Keywords: Anti-reflective coating; Stray light

Abstract Perfect absorbers with extremely high absorption are of crucial importance for many applications such as harvesting solar energy and eliminating stray light. A key point their is ultralow photon escaping rate (PER) easy fabrication process, which enables to maximize utilization or minimize the influence An ultrathin perfect absorber (total thickness 226 nm) reported in this work dielectric plasmonic nanocomposite (titanium nitride (TiN) embedded aluminum (AlN)) antireflective coating (ARC). It can be fabricated by low‐cost one‐step sputtering approach a very large area (200 × 200 mm 2 demonstration) on almost any substrates, including flexible polyethylene‐terephthalate. The average PER only 0.4% whole visible range 400–750 nm. As an example, used laser scanning confocal microscope eliminate strong light enhance signal‐to‐noise ratio, improves clarity contrast imaging remarkably. not match requirement energy, but also suitable elimination weak signal detection instruments, etc.