Effects of Thermal Annealing Upon the Nanomorphology of Poly(3‐hexylselenophene)‐PCBM Blends

• DOI: 10.1002/marc.201100330
• Publication Date: 2011-07-07T15:03:57Z
• Authors: Samuele Lilliu; Tiziano Agostinelli; Eric Verploegen; Ellis Pires; Mark Hampton; Mohammed Al‐Hashimi; Martin J. Heeney; Michael F. Toney; Jenny Nelson; J. Emyr Macdonald
• Keywords: Polythiophene

Abstract Grazing incidence X‐ray diffraction (GI‐XRD) is used to characterize the crystallographic dynamics of low molecular weight (LMW) and high (HMW) poly(3‐hexylselenophene) (P3HS) films blend P3HS with [6‐6‐]‐phenyl‐C 61 ‐butyric acid methyl ester (PCBM) as a function ‘step‐by‐step’ thermal annealing, from room temperature 250 °C. The temperature‐dependent GIXRD data show how melting point crystallites decreased by presence PCBM. crystallite domain sizes dramatically increase upon annealing temperature. formation well‐oriented HMW (100) plane parallel substrate (edge‐on orientation), when cooled melt, are observed. We compare behaviour pure that poly(3‐hexyl)thiophene (P3HT) PCBM blended suggest similar dependent we observe may be common polythiophene related polymers their blends. magnified image