High efficiency triple junction thin film silicon solar cells with optimized electrical structure

Triple junction p–n junction Tunnel junction Open-circuit voltage
DOI: 10.1002/pip.2564 Publication Date: 2014-11-17T09:24:54Z
ABSTRACT
Abstract We report on improving the performance of pin‐type a‐Si:H/a‐SiGe:H/µc‐Si:H triple‐junction solar cells and corresponding single‐junction in this paper. Based wet‐etching sputtered aluminum‐doped zinc oxide (ZnO:Al) substrates with optimized surface morphologies photo‐electrical material properties, after adjusting individual utilized various optimization techniques, we pay close attention to tunnel recombination junctions (TRJs). By means a‐Si:H/a‐SiGe:H a‐SiGe:H/µc‐Si:H double‐junction cells, compensated for open circuit voltage ( V oc ) loss at TRJ by adopting a p‐type µc‐Si:H layer low activation energy. combining top/middle, middle/bottom TRJs little electrical losses, an initial efficiency 15.06% was achieved cells. Copyright © 2014 John Wiley & Sons, Ltd.
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