Combination of high‐resolution RBS and angle‐resolved XPS: accurate depth profiling of chemical states

• DOI: 10.1002/sia.2628
• Publication Date: 2008-01-07T14:14:11Z
• Authors: Kenji Kimura; Kaoru Nakajima; Ming Zhao; Hiroshi Nohira; Takeo Hattori; Masaaki Kobata; Eiji Ikenaga; Jung Jin Kim; Keisuke Kobayashi; Thierry Conard; Wilfried Vandervorst
• Keywords: Photoelectric effect; Chemical state; Profiling (computer programming); Attenuation length

Abstract A new method for the combination analysis of high‐resolution Rutherford backscattering spectroscopy (HRBS) and angle‐resolved X‐ray photoelectron (AR‐XPS) is proposed accurate depth profiling chemical states. In this method, attenuation lengths (ALs) photoelectrons are first determined so that AR‐XPS result consistent with HRBS result. Depth states then performed in using composition‐depth profiles obtained by as constrained conditions. This successfully applied to Hf‐based gate stack structures demonstrating its feasibility. Copyright © 2008 John Wiley & Sons, Ltd.