Large Area Resist‐Free Soft Lithographic Patterning of Graphene

• DOI: 10.1002/smll.201201889
• Publication Date: 2012-11-19T11:11:13Z
• Authors: Antony George; S. Mathew; Raoul van Gastel; Maarten Nijland; K. Gopinadhan; Peter Brinks; T. Venkatesan; Johan E. ten Elshof
• Keywords: Soft Lithography

Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large and cost effective soft lithographic strategy presented for graphene. The technique applicable on any arbitrary substrate that needs to be covered with film provides viable route large-area of device applications.