High growth ratein situ preparation of Y1Ba2Cu3O7?x films by a new co-evaporation method using an arc-discharge plasma source
Electric arc
DOI:
10.1007/bf00729476
Publication Date:
2004-12-02T13:33:03Z
AUTHORS (4)
ABSTRACT
The objective of this study was to apply this highly dense plasma evaporation (HDPE) process to prepare high quality YBa 2 Cu 3 O 7-δ films at high growth rate
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