Growth of boron nitride nanotube film in situ

02 engineering and technology 0210 nano-technology
DOI: 10.1007/s00339-004-2919-0 Publication Date: 2004-06-22T11:13:27Z
ABSTRACT
A novel method was demonstrated to fabricate boron nitride nanotube films on silicon substrate in a location-controlled fashion. The pre-deposited SiO2 layer on the substrate controls the growth space of BN nanotubes synthesized by an ammonothermal reaction of boron and its oxide.
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