Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

• DOI: 10.1007/s00339-017-1393-4
• Publication Date: 2017-12-29T09:38:54Z
• Authors: Ying Liu; Dietmar Hirsch; Renate Fechner; Yilin Hong; Shaojun Fu; Frank Frost; Bernd Rauschenbach
• Keywords: Deposition; Morphology

The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface fused silica (SiO2). dependence the rms roughness and deposited amount Al on distance from source under Ar+ IBS was investigated SiO2, surfaces, using atomic force microscopy X-ray photoelectron spectroscopy. Although amounts these three surfaces all decreased increasing target, morphology did not demonstrate strong dependence. In contrast Si, both SiO2 exhibited similar evolution trend increasing, decreasing, final stabilization at where results were those obtained without co-deposition. However, showed stronger modulation than surfaces. At incidence angles 60° 70°, dot-decorated ripples roof-tiles formed respectively, whereas nanostructures closely aligned grains blazed facets generated respectively. combination found facilitate formation novel types morphological growth. initial act as template guide preferential deposition tops or ripple sides facing wedge, but in valleys between ripples, leading 2D quasi-blazed grating, which offer significant promise optical applications. enhancement attributed AlSi, AlOxFy compounds originating mainly source.