Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors

• DOI: 10.1007/s00340-020-07431-6
• Publication Date: 2020-04-15T12:02:26Z
• Authors: Y. Chen; D. Hahner; M. Trubetskov; S. Schrameyer; W. Sakiew; K. Starke; V. Pervak
• Keywords: 01 natural sciences; 0104 chemical sciences

Abstract We have compared two kinds of dispersive mirrors (DMs) produced by magnetron sputtering and ion beam sputtering. One them is a broadband DM which known as double-angle DM, providing group delay dispersion (GDD) $$-40 \mathrm{{fs}}^2$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:mo>-</mml:mo><mml:mn>40</mml:mn><mml:msup><mml:mrow><mml:mi>fs</mml:mi></mml:mrow><mml:mn>2</mml:mn></mml:msup></mml:mrow></mml:math> in the range 550–1050 nm. The other one robust highly mirror, provides GDD about $$-275 xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mrow><mml:mo>-</mml:mo><mml:mn>275</mml:mn><mml:msup><mml:mrow><mml:mi>fs</mml:mi></mml:mrow><mml:mn>2</mml:mn></mml:msup></mml:mrow></mml:math> at 800 nm covers wavelength from 690 to 890 For first time, comparison between magnetron-sputtering-produced ion-beam-sputtering-produced performed.