Graphene synthesis by thermal chemical vapor deposition using solid precursor

• DOI: 10.1007/s10854-013-1073-x
• Publication Date: 2013-01-25T07:34:23Z
• Authors: Mohsin Ahmed; Naoki Kishi; Ryo Sugita; Akiji Fukaya; Ishwor Khatri; JianBo Liang; Sharif Mohammad M...; Tetsuo Soga; Takashi Jimbo
• Keywords: Deposition

We report single layer to few layer graphene on polycrystalline nickel by chemical vapor deposition at ambient pressure using solid precursor, camphor. Investigating at a wide range of temperature, it was observed that 870 °C is better for the deposition of single layer graphene on nickel substrate. The percentage of single layer on the substrate reduced significantly with decreasing the deposition temperature. The full width half maximum of the synthesized single layer graphene was 21 cm−1 and Raman intensity ratio of 2D to G peak was almost nine. The film was transferred to insulating substrate and measured transmittance was 85 %. Raman spectroscopy, Raman mapping, SEM and UV–visible spectrometer measurement were performed for characterization.