PLD thin films obtained from CrO3 and Cr8O21 targets

• DOI: 10.1016/j.apsusc.2005.01.073
• Publication Date: 2005-02-27T00:44:46Z
• Authors: F. Guinneton; O. Monnereau; L. Argeme; D. Stanoi; G. Socol; I.N. Mihailescu; T. Zhang; C. Grigorescu; H.J. Trodahl; L. Tortet
• Keywords: 02 engineering and technology; 0210 nano-technology

Abstract Thin films of chromium oxides mixtures have been grown on sapphire substrates using pulsed laser deposition (PLD). The work originates from the goal of enhancing the CrO2 concentration in the films deposited from targets made of various chromium oxides. Their stability depends on temperature and pressure conditions. The PLD experiments are reviewed with the aim of discussing the influence of the target composition and of the deposition conditions upon the resulted films. The targets and corresponding thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and Raman spectroscopy. The Cr8O21 targets are the most stable, which allows the preparation of thin films with a reproducible CrO2 content of about 25% and a satisfactory surface morphology.