Preparation and characterization of titanium oxy-nitride thin films

• DOI: 10.1016/j.apsusc.2007.02.179
• Publication Date: 2007-03-06T11:54:53Z
• Authors: M. Braic; M. Balaceanu; A. Vladescu; A. Kiss; V. Braic; G. Epurescu; G. Dinescu; A. Moldovan; R. Birjega; M. Dinescu
• Keywords: Pulsed Laser Deposition; Characterization; Deposition; Scratch

Abstract The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.