Nanohole morphologies on photoresist surface produced by low-energy Ar+ ion bombardment under normal and near-normal incidence

• DOI: 10.1016/j.apsusc.2020.147515
• Publication Date: 2020-08-13T01:31:32Z
• Authors: Gaoyuan Yang; Dietmar Hirsch; Jinyu Li; Ying Liu; Frank Frost; Yilin Hong
• Keywords: Photoresist; Collision cascade

Random nanohole morphologies on a photoresist surface were produced spontaneously by ion bombardment, from normal to near-normal incidence. At an optimized energy, the critical parameters (diameter and depth) uniformity of these nanoholes can be tailored with multi-ion parameters, including fluence (i.e. bombardment time), flux, incidence angle. The temporal evolution structures, at incidence, showed growth stabilization regimes. mass redistribution effect distribution energy deposition led transition nanoripples, which deduced crater shape low angles. angle-dependent (or rim) resist is consistent function simulation, confirms bombardment-induced atomic currents redistribution. Finally, X-ray photoelectron spectroscopy characterization confirmed decomposition, in particular, graphitization layer resist.