Deposition of MAX phase-containing thin films from a (Ti,Zr)2AlC compound target

• DOI: 10.1016/j.apsusc.2021.149370
• Publication Date: 2021-02-25T03:06:53Z
• Authors: Clio Azina; Bensu Tunca; Andrejs Petruhins; Binbin Xin; Melike Yildizhan; Per O.Å. Persson; Jozef Vleugels; Konstantina Lambr...; Johanna Rosen; Per Eklund
• Keywords: Technology; Materials Science; FOS: Physical sciences; 02 engineering and technology; Physics, Applied; Inorganic Chemistry; Materials Science, Coatings & Films; M(N+1)AX(N) PHASES; (TiZr)(2)AlC; COATINGS; Oorganisk kemi; Condensed Matter - Materials Science; Science & Technology; MAX phase solid solution; Chemistry, Physical; Physics; Materials Science (cond-mat.mtrl-sci); MECHANICAL-PROPERTIES; Chemistry; Physics, Condensed Matter; Physical Sciences; CR2ALC; Compound target; THERMAL-EXPANSION; MICROSTRUCTURE; 0210 nano-technology; Magnetron sputtering; Magnetron sputtering; Compound target; MAX phase solid solution; (TiZr)(2)AlC

This work reports on sputter depositions carried out from a compound (Ti,Zr)2AlC target, whereupon Al-containing (Ti,Zr)C thin films (30-40 nm in thickness) were deposited on MgO(111) and Al2O3(0001) substrates at temperatures ranging between 500 and 900 °C. The presence of Al within the carbide structure was evidenced by lattice parameter variations. Furthermore, chemical analyses showed that the Al distribution throughout the film thickness was fairly homogeneous. Thicker films (80-90 nm) deposited from the same compound target consisted of the pseudo-binary (Ti,Zr)C and intermetallic compounds in the Ti-Zr-Al system up to 800 °C, as well as solid solution MAX phases with different Ti:Zr ratios at 900 °C. X-ray diffraction and transmission electron microscopy showed that both (Ti,Zr)2AlC and (Ti,Zr)3AlC2 solid solution MAX phases were formed. Moreover, this work discusses the growth mechanism of the thicker films, which started with the formation of the mixed (Ti,Zr)C carbide, followed by the nucleation and growth of aluminides, eventually leading to the formation of the MAX phases, which was the primary objective of the sputter depositions.