Enhancement of Laser-Induced Damage Threshold of HfO2 Thin Films via Substrate Heating During Magnetron Sputtering
Cavity magnetron
DOI:
10.1016/j.apsusc.2025.162853
Publication Date:
2025-03-01T23:19:41Z
AUTHORS (6)
ABSTRACT
SUPPLEMENTAL MATERIAL
Coming soon ....
REFERENCES (26)
CITATIONS (0)
EXTERNAL LINKS
PlumX Metrics
RECOMMENDATIONS
FAIR ASSESSMENT
Coming soon ....
JUPYTER LAB
Coming soon ....