Sunlight photocatalytic degradation of ofloxacin using UiO-66/wood composite photocatalysts

• DOI: 10.1016/j.cclet.2021.06.048
• Publication Date: 2021-06-24T23:48:21Z
• Authors: Linhong Shi; Xue Zou; Tengfei Wang; Dongmei Wang; Meikun Fan; Zhengjun Gong
• Keywords: Photodegradation; Degradation; Reusability; Hydroxyl radical

Abstract This study synthesized UiO-66 (Zr) in situ on wood via a one-step solvothermal method. UiO-66/wood was successfully prepared and its catalytic performance for the ofloxacin (OFX) photodegradation under simulate sunlight was also explored. UiO-66/wood exhibited a better catalytic performance, and its degradation rate constant was about 1.2 and 1.5 times than that of UiO-66 and wood, respectively. The effects of solution initial concentration, pH of the system and dosage of the photocatalyst were explored. Additionally, the active species trapping experiments and UV–vis diffused reflectance spectra measurements were conducted to investigated the photocatalytic mechanism of the UiO-66/wood composite, superoxide radical (O2•–) and hydroxyl radical (•OH) were the main reactive species. In addition, the possible degradation pathways of OFX were analyzed by LC-MS. Meanwhile, the UiO-66/wood showed outstanding stability and reusability after 4 cycles experiments. The removal performance of UiO-66/wood towards real samples showed it has potential in actual application .