In situ click-assembling monolayers on copper surface with enhanced corrosion resistance

• DOI: 10.1016/j.corsci.2016.10.016
• Publication Date: 2016-10-21T03:32:13Z
• Authors: Yinzhe Yu; Yizhen Wang; Jin Li; Daquan Zhang; Lixin Gao
• Keywords: 02 engineering and technology; 0210 nano-technology

Abstract The self-assembled monolayer (SAMs) of 2-(1-tosyl-1H-1,2,3-triazol-4-yl) propan-2-ol (TTP) was in-situ assembled on copper surface via click chemistry reaction between 2, 2-dimethylethynyl carbinol (MBY) and tosyl azide (TA). The electrochemical results indicate that the click-assembled TTP film can strongly suppress the corrosion reaction of copper in 3 wt.% NaCl and its protection efficiency is 93.6%. Polarization curves show that TTP SAMs is an anodic passivation type inhibitor. The adsorption of TTP molecules on Cu2O (0 0 1) surface is in the flat orientation of the nearby triazole ring and O atoms.