Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process

• DOI: 10.1016/j.ecoenv.2021.112908
• Publication Date: 2021-10-19T21:20:56Z
• Authors: Jie Zhong; Bin Yang; Fang-Zhou Gao; Qian Xiong; Yong Feng; Yu Li; Jin-Na Zhang; Guang-Guo Ying
• Keywords: Degradation; Sulfamethoxazole

Incomplete removal of antibiotics and antibiotic resistance genes (ARGs) has often been reported in wastewater treatment plants. More efficient processes are needed to reduce their risks the environment. Herein, we evaluated degradation ARGs by using magnetic anion exchange resin (MAER) as UV-Fenton catalyst. Sulfamethoxazole (SMZ), ofloxacin (OFX), amoxicillin (AMX) were selected target compounds. The three almost completely degraded (> 99%) following MAER reaction for 30 min. From mechanism study, it was found that Fe3+/Fe2+ could be cyclically transferred from catalyst at permeable interface, photo-generated electrons effectively separated. dominant reactive radicals hydroxide during reaction. pathway sulfamethoxazole proposed. In addition, samples a plant applied investigate efficiency system. A rapid decrease level observed with this results study suggest MAER-mediated effective wastewater.