Unloading of hazardous Cr and Tannic Acid from real and synthetic waste water by novel fungal consortia

Tannic acid Aspergillus niger
DOI: 10.1016/j.eti.2021.102230 Publication Date: 2022-01-17T17:01:51Z
ABSTRACT
Fungal strains; resistant to Chromium (Cr) and tannic acid were isolated from tannery effluents rDNA gene sequentially identified as Aspergillus niveus MCC 1318, flavus 1317 niger 1316. The minimum inhibitory concentration (MIC) of the reported isolates ranged up 200 ppm 5% for Cr acid, respectively. Theoretical optimization various physiochemical parameters removal was supported using Plackett–Burman design response surface methodology (RSM). A. niveus, and, able remove 80%, 82% 88% residual found be 20%, 27%, 25% A hike 10% in case novel fungal consortia niger, niveus. Enhanced biodegradation (4%–9%) also observed presence consortia. Bioremediation efficiency individual strains other heavy metals such Zn, Pb, Cd Ni 55%, 68%, 41% 69% respectively 60%, 59%, 59% 50% 63%, 52%, 68% 58% flavus. An incomparable i.e. 70%, 80% 75% Fourier transform infrared spectroscopy (FTIR) unveil adsorption phenomena by revealing interactions adsorbed with methyl methylene groups, secondary amides, phosphate groups present media.
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