Homogeneous vs. heterogeneous photo-Fenton elimination of antibiotic-resistant bacteria bearing intracellular or extracellular resistance: Do resistance mechanisms interfere with disinfection pathways?

• DOI: 10.1016/j.jece.2024.112147
• Publication Date: 2024-02-06T01:25:50Z
• Authors: Jeremie Decker; Truong-Thien Melv...; Jose Manuel Entenza; Isabel del Castil...; Aurelio Hernandez...; Cesar Pulgarin; Jorge Rodriguez-C...; Stefanos Giannakis
• Keywords: Extracellular polymeric substance

The present study aimed to fill the knowledge gap between implications of intracellular and extracellular antibiotic resistance mechanisms may inflict on inactivation pathways photo-Fenton process under mild conditions. It was thus designed as a cross-comparison effect homogeneous heterogeneous (near-neutral pH, [Fe]=1 mg/L, [H2O2]=10 mg/L) seven strains Staphylococcus aureus exhibiting different resistance, or susceptibility. Additionally, variations in tolerance (MIC test) relative changes presence genes were qualitatively monitored during treatment using PCR. results suggest that antibiotics does not confer enhanced photo-Fenton, it attained 4-logU reduction within 50–100 min for all strains, regardless status. Strains express do pose risk; however, external their defense against occasionally interfere with process. This phenomenon mainly linked cell wall thickening some externally resistant compared susceptible homologues. Eventually, by conferring antibiotics, this alteration reduce susceptibility Fenton-related reagents either reducing diffusion rendering walls less prone leaching upon attacks. In addition, remained unchanged lowered threshold. Moreover, system considerably detection 90 respect hv, hv/H2O2, photo-Fenton. conclusion, could be an effective hindering spread but conditions should aim maximize degradation ARG, concentration decreases more slowly than bacteria.