Evaluation of residual stresses in Cu/Mo, Cu/Nb nanomultilayers with a strong fiber texture

• DOI: 10.1016/j.matlet.2023.135074
• Publication Date: 2023-08-19T06:49:42Z
• Authors: Jeyun Yeom; Giacomo Lorenzin; Claudia Cancellieri; Jolanta Janczak-R...
• Keywords: Texture (cosmology)

Residual stresses are one of the key factors for tuning properties, microstructure, and reliability thin films nanomultilayers, but their measurement evaluation challenging. in nanomultilayers with {1 1 0} out-of-plane texture exhibit a dependence on in-plane crystal orientation, which complicates using X-ray diffraction. The residual were investigated two representative immiscible materials fcc/bcc structure: Cu/Mo Cu/Nb grown Si substrate an amorphous silicon nitride layer. Both multilayered structures exhibited Cu 1} // Mo, respectively Nb fiber texture, showed compressive stress. A modified crystallite group method 0}, was used to determine nanomultilayers. proven be good tool extract stress strong texture.