Fabrication of ZrO2 nanopatterns for biomimetic antireflection by thermal nanoimprint lithography

• DOI: 10.1016/j.mee.2012.07.111
• Publication Date: 2012-08-16T11:02:15Z
• Authors: Jae Kwan Kim; Seong-Je Park; Sarah Kim; Hyeong-Ho Park; Ki-don Kim; Jun-Hyuk Choi; Jihye Lee; Dae-Geun Choi; Kahp Y. Suh; Jun-Ho Jeong
• Keywords: 0103 physical sciences; 01 natural sciences

We present a simple thermal nanoimprint method to fabricate biomimetic moth-eye nanostructures for enhancing transmittance using an ultraviolet (UV) curable perfluoropolyether (PFPE) for the polymer mold and zirconium dioxide (ZrO"2) as the imprint material. To transfer the moth-eye nanostructures, a replicated PFPE mold from the Nickel (Ni) master was imprinted onto spin-coated ZrO"2 film with a pressure of 6bar and temperature of 150^oC. The results revealed that imprinted ZrO"2 moth-eye nanostructures have excellent property such as transmittance (97.6%) when the both-sided pattern was fabricated on the glass substrate.