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Vacuum cleaning of amorphous carbon using hydrogen plasma for EUV lithography

Extreme Ultraviolet Lithography Amorphous carbon Carbon fibers Plasma cleaning
DOI: 10.1016/j.mseb.2024.117545 Publication Date: 2024-07-03T09:47:29Z
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AUTHORS (9)
Guo Yang
Lifang Wu
Tao Wang
Xingyang Wu
Shenghao Wang
Luqiao Yin
Zihan Wang
Lin Jiang
Jianhua Zhang
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