Study on the effect of melt flow behavior on the uniformity of phosphorus doping during the growth of large-size n-type monocrystalline silicon by Czochralski method
Crucible (geodemography)
Crystal (programming language)
Melt flow index
Micro-pulling-down
DOI:
10.1016/j.mssp.2024.108261
Publication Date:
2024-02-27T10:54:30Z
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