Study on the effect of melt flow behavior on the uniformity of phosphorus doping during the growth of large-size n-type monocrystalline silicon by Czochralski method

Crucible (geodemography) Crystal (programming language) Melt flow index Micro-pulling-down
DOI: 10.1016/j.mssp.2024.108261 Publication Date: 2024-02-27T10:54:30Z