Processing and characterization of epitaxial GaAs radiation detectors
Defect characterization
Solid state radiation detectors
Physics - Instrumentation and Detectors
ta213
ta114
Wafer processing
GaAs
ta221
FOS: Physical sciences
Instrumentation and Detectors (physics.ins-det)
01 natural sciences
7. Clean energy
03 medical and health sciences
TCAD simulations
0302 clinical medicine
0103 physical sciences
ta318
ta216
ta116
DOI:
10.1016/j.nima.2015.03.028
Publication Date:
2015-03-29T07:15:36Z
AUTHORS (15)
ABSTRACT
7 pages, 10 figures, 10th International Conference on Radiation Effects on Semiconductor Materials, Detectors and Devices (RESMDD14), 8-10 October, Firenze, Italy<br/>GaAs devices have relatively high atomic numbers (Z=31, 33) and thus extend the X-ray absorption edge beyond that of Si (Z=14) devices. In this study, radiation detectors were processed on GaAs substrates with 110 $��\textrm{m}$ - 130 $��\textrm{m}$ thick epitaxial absorption volume. Thick undoped and heavily doped p$^+$ epitaxial layers were grown using a custom-made horizontal Chloride Vapor Phase Epitaxy (CVPE) reactor, the growth rate of which was about 10 $��\textrm{m}$/h. The GaAs p$^+$/i/n$^+$ detectors were characterized by Capacitance Voltage ($CV$), Current Voltage ($IV$), Transient Current Technique (TCT) and Deep Level Transient Spectroscopy (DLTS) measurements. The full depletion voltage ($V_{\textrm{fd}}$) of the detectors with 110 $��\textrm{m}$ epi-layer thickness is in the range of 8 V - 15 V and the leakage current density is about 10 nA/cm$^2$. The signal transit time determined by TCT is about 5 ns when the bias voltage is well above the value that produces the peak saturation drift velocity of electrons in GaAs at a given thickness. Numerical simulations with an appropriate defect model agree with the experimental results.<br/>
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