Processing and characterization of epitaxial GaAs radiation detectors

Defect characterization Solid state radiation detectors Physics - Instrumentation and Detectors ta213 ta114 Wafer processing GaAs ta221 FOS: Physical sciences Instrumentation and Detectors (physics.ins-det) 01 natural sciences 7. Clean energy 03 medical and health sciences TCAD simulations 0302 clinical medicine 0103 physical sciences ta318 ta216 ta116
DOI: 10.1016/j.nima.2015.03.028 Publication Date: 2015-03-29T07:15:36Z
ABSTRACT
7 pages, 10 figures, 10th International Conference on Radiation Effects on Semiconductor Materials, Detectors and Devices (RESMDD14), 8-10 October, Firenze, Italy<br/>GaAs devices have relatively high atomic numbers (Z=31, 33) and thus extend the X-ray absorption edge beyond that of Si (Z=14) devices. In this study, radiation detectors were processed on GaAs substrates with 110 $��\textrm{m}$ - 130 $��\textrm{m}$ thick epitaxial absorption volume. Thick undoped and heavily doped p$^+$ epitaxial layers were grown using a custom-made horizontal Chloride Vapor Phase Epitaxy (CVPE) reactor, the growth rate of which was about 10 $��\textrm{m}$/h. The GaAs p$^+$/i/n$^+$ detectors were characterized by Capacitance Voltage ($CV$), Current Voltage ($IV$), Transient Current Technique (TCT) and Deep Level Transient Spectroscopy (DLTS) measurements. The full depletion voltage ($V_{\textrm{fd}}$) of the detectors with 110 $��\textrm{m}$ epi-layer thickness is in the range of 8 V - 15 V and the leakage current density is about 10 nA/cm$^2$. The signal transit time determined by TCT is about 5 ns when the bias voltage is well above the value that produces the peak saturation drift velocity of electrons in GaAs at a given thickness. Numerical simulations with an appropriate defect model agree with the experimental results.<br/>
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