Deposition of silicon carbide interface coating on carbon fibre by PECVD for advanced composites

• DOI: 10.1016/j.surfin.2017.03.006
• Publication Date: 2017-03-18T16:18:49Z
• Authors: Rahul Pillai; Naresh Batra; L.M. Manocha; N. Machinewala
• Keywords: Deposition; Carbon fibers

Abstract The bipolar pulsed power plasma enhanced chemical vapor deposition method (PECVD) was used to deposit crystalline silicon carbide on the carbon fiber substrate. The β-SiC was deposited at a lower temperature of 150°C under the influence of Argon plasma. The polycarbosilane (PCS) was used as the source for silicon and carbon. The deposited coating on fiber was characterized using XRD for the phase detection and for the identification of crystallinity. The scanning electron microscope (SEM) was used for the morphological studies. The energy dispersive spectroscopy (EDS) was employed for identifying the elemental composition of the deposited coating.