α-Cr2O3 template-texture effect on α-Al2O3 thin-film growth

• DOI: 10.1016/j.tsf.2008.03.038
• Publication Date: 2008-04-08T12:07:06Z
• Authors: P. Eklund; M. Sridharan; M. Sillassen; J. Bøttiger
• Keywords: Annan materialteknik; X-ray diffraction (XRD);Transmission electron microscopy (TEM);Aluminum oxide;; Other Materials Engineering; 02 engineering and technology; 0210 nano-technology

Abstract We employ textured α-Cr 2 O 3 thin films as templates for growth of α-Al 2 O 3 by reactive inductively coupled plasma magnetron sputtering. The texture of the template has a strong influence on the nucleation and growth of α-Al 2 O 3 . Extended growth of α-Al 2 O 3 at a substrate temperature of 450 °C is obtained using a predominantly [1014]-textured α-Cr 2 O 3 template layer, while only limited α-Al 2 O 3 nucleation is seen on a [0001]-textured α-Cr 2 O 3 template.