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Study of deposition parameters of reactive-sputtered Si3N4 thin films by optical emission spectroscopy

Deposition Ellipsometry Characterization Light emission
DOI: 10.1016/j.tsf.2022.139313 Publication Date: 2022-05-21T03:52:24Z
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AUTHORS (7)
R. Rodríguez-López
G. Soto-Valle
R. Sanginés
N. Abundiz-Cisneros
J. Águila-Muñoz
J Cruz
R. Machorro-Mejía
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