XPS Study of Nanostructured Rhodium Oxide Film Comprising Rh4+ Species

• DOI: 10.1021/acs.jpcc.6b05219
• Publication Date: 2016-08-17T18:30:33Z
• Authors: Lidiya S. Kibis; Andrey I. Stadnic...; Sergey V. Koscheev; Vladimir I. Zaiko...; Andrei I. Boronin
• Keywords: Reactivity; Thermal Stability

Studies of highly oxidized rhodium species as potential active sites in catalytic oxidation reactions are great interest. In this work, we investigated the properties nanostructured film prepared by radio frequency discharge an oxygen atmosphere. The charge states Rh RhOx particles, their thermal stability, and reactivity toward CO were analyzed comparison with thermally Rh2O3 oxide. formation Rh4+ a composition Rh4+/Rh3+ oxyhydroxide structures was shown to take place plasma-synthesized films. stable up 150 °C demonstrated reaction at 100 °C. reoxidation partially reduced Rh/RhOx observed under treatment molecular O2. However, not recovered such conditions.