The Modulation of Electrokinetic Streaming Potentials of Silicon-Based Surfaces through Plasma-Based Surface Processing

• DOI: 10.1021/acs.langmuir.2c01168
• Publication Date: 2022-09-23T20:23:33Z
• Authors: Li Cheng; Bei Fan; Zichen Zhang; Aaron McLeod; Wade Shipley; Prabhakar Bandaru
• Keywords: Zeta potential; Streaming current; Microchannel; Surface pressure

A new plasma processing-based methodology for enhancing the streaming potential (Vs) that may be obtained in electrokinetic flows a given pressure gradient over silicon surface-based microchannel is indicated. The dependence of Vs on both surface zeta and electrolyte slip length was carefully determined through series experiments involving variation CF4- Ar-based parameters, incorporating pressure, exposure time, power. It analytical estimates that, while always increased, diminished under certain conditions. record value ∼0.1 mV/Pa using CF4 at 500 W, 10 mTorr, 300 s exposure. implications work extend to investigation whether smooth surfaces effective generating large Vs's modalities electrical voltage sources microfluidics-based applications.