Selection of Di(meth)acrylate Monomers for Low Pollution of Fluorinated Mold Surfaces in Ultraviolet Nanoimprint Lithography

• DOI: 10.1021/acs.langmuir.5b00325
• Publication Date: 2015-03-20T19:41:50Z
• Authors: Masaru Nakagawa; Kei Kobayashi; Azusa N. Hattori; Shunya Ito; Nobuya Hiroshiba; Shoichi Kubo; Hidekazu Tanaka
• Keywords: Fluoropolymer; UV-Curing; Nanoimprint lithography

We used fluorescence microscopy to show that low adsorption of resin components by a mold surface was necessary for continuous ultraviolet (UV) nanoimprinting, as well generation release energy on detachment cured from template mold. This is because with pollution, fracture demolding occurred at the interface between and surfaces rather than outermost part resin. To achieve we investigated radical photopolymerization behaviors fluorescent UV-curable resins mechanical properties (fracture toughness, hardness, energy) films six types di(meth)acrylate-based monomers similar chemical structures, in which polar hydroxy aromatic bulky bisphenol moieties methacryloyl or acryloyl reactive groups were present absent. As result, selected A glycerolate dimethacrylate (BPAGDM), contains hydroxy, bisphenol, moieties, give good properties, monomer bulkiness, mild reactivity, respectively, suitable base UV nanoimprinting under an easily condensable alternative chlorofluorocarbon (HFC-245fa) atmosphere. The BPAGDM lithographic ion etching silicon 32 nm line-and-space patterns without hard metal layer.