Wafer-Scale Production of Transition Metal Dichalcogenides and Alloy Monolayers by Nanocrystal Conversion for Large-Scale Ultrathin Flexible Electronics

• DOI: 10.1021/acs.nanolett.1c02991
• Publication Date: 2021-10-22T14:26:22Z
• Authors: Jihoon Kim; Hyojin Seung; Dohun Kang; Joodeok Kim; Hyeonhu Bae; Hayoung Park; Sungsu Kang; Changsoon Choi; Back Kyu Choi; Ji Soo Kim; Taeghwan Hyeon; Hoonkyung Lee; Dae-Hyeong Kim; Sangdeok Shim; Jungwon Park
• Keywords: 0301 basic medicine; 03 medical and health sciences

Two-dimensional (2D) transition metal dichalcogenide (TMD) layers are unit-cell thick materials with tunable physical properties according to their size, morphology, and chemical composition. Their transition of lab-scale research to industrial-scale applications requires process development for the wafer-scale growth and scalable device fabrication. Herein, we report on a new type of atmospheric pressure chemical vapor deposition (APCVD) process that utilizes colloidal nanoparticles as process-scalable precursors for the wafer-scale production of TMD monolayers. Facile uniform distribution of nanoparticle precursors on the entire substrate leads to the wafer-scale uniform synthesis of TMD monolayers with the controlled size and morphology. Composition-controlled TMD alloy monolayers with tunable bandgaps can be produced by simply mixing dual nanoparticle precursor solutions in the desired ratio. We also demonstrate the fabrication of ultrathin field-effect transistors and flexible electronics with uniformly controlled performance by using TMD monolayers.