Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD

• DOI: 10.1021/acs.nanolett.5b04586
• Publication Date: 2016-01-12T16:22:26Z
• Authors: Sabina Caneva; Robert S. Weatherup; Bernhard C. Bayer; Raoul Blume; Andrea Cabrero-Vi...; Philipp Braeuning...; Marie-Blandine Ma...; Ruizhi Wang; Carsten Baehtz; Robert Schloegl; Jannik C. Meyer; Stephan Hofmann
• Keywords: Hexagonal boron nitride; Borazine

Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution nitrogen into catalyst bulk via NH3 exposure prior to actual step. This “pre-filling” reservoir allows us control and limit uptake B N species during borazine thereby incubation time h-BN kinetics while also limiting contribution uncontrolled precipitation-driven cooling. Using in situ X-ray diffraction photoelectron spectroscopy combined with systematic calibrations, we develop an understanding framework for engineering optimize process, which relevant other 2D materials their heterostructures.