Direct Multitier Synthesis of Two-Dimensional Semiconductor 2H-MoTe2
Compound semiconductor
Deposition
DOI:
10.1021/acsaelm.2c01260
Publication Date:
2022-11-30T19:39:26Z
AUTHORS (7)
ABSTRACT
Two-dimensional (2D) 2H-MoTe2 is an emerging semiconductor with promising electronic and optoelectronic properties. Meanwhile, the in-plane 2D epitaxy mechanism via 1T′ to 2H phase transition allows synthesis of on arbitrary surfaces. Here, we demonstrate two routes for tier-by-tier growth one-step synthesize multitier isolated by atomic layer deposition aluminum oxide (Al2O3). Raman, scanning transmission electron microscopy, other characterizations show that periodic 2H-MoTe2/Al2O3 multilayer structure exhibits characteristics large-area preparation high crystallinity. Our direct move first step toward realizing 3D-ICs nonvolatile memories based semiconducting 2H-MoTe2.
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