Optoelectronic Memory Capacitor Based on Manipulation of Ferroelectric Properties
Ferroelectric capacitor
Non-Volatile Memory
DOI:
10.1021/acsami.1c14528
Publication Date:
2021-10-28T17:45:29Z
AUTHORS (2)
ABSTRACT
Here, we report on the fabrication of an optoelectronic memcapacitor (memory capacitor) by manipulation ferroelectric properties through ferroelectric-semiconductor interface based a ZnO/PZT (Pb1.1(Zr0.52Ti0.48)O3) capacitor. A ZnO layer was deposited PZT chemical vapor deposition method to achieve memcapacitive effect. The capacitance-voltage and time-dependent capacitance characteristics Al/ZnO/PZT/Al were used as main outcome measurement. In asymmetric structure with layer, two stable states in obtained, which can be written either optical or electrical pulses. addition, illuminated capacitive characters device showed photovoltaic effect that is sensitive wavelengths for nondestructive readout. Thus, this work proposes low-cost solid-state exhibiting promising potential memory computation applications ability program readout signals.
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