Soft-Shear-Aligned Vertically Oriented Lamellar Block Copolymers for Template-Free Sub-10 nm Patterning and Hybrid Nanostructures

• DOI: 10.1021/acsami.1c23865
• Publication Date: 2022-03-04T18:55:44Z
• Authors: Maninderjeet Singh; Aman Agrawal; Wenjie Wu; Ali Masud; Edward Armijo; Damian Gonzalez; Shenghui Zhou; Tanguy Terlier; Chenhui Zhu; Joseph Strzalka; Krzysztof Matyjas...; Michael Bockstaller; Jack F. Douglas; Alamgir Karim
• Keywords: 02 engineering and technology; 0210 nano-technology

The template-free unidirectional alignment of lamellar block copolymers (l-BCPs) for sub-10 nm high-resolution patterning and hybrid multicomponent nanostructures is important technological applications. We demonstrate a modified soft-shear-directed self-assembly (SDSA) approach aligning pristine l-BCPs with incorporated polymer-grafted nanoparticles (PGNPs), as well the l-BCP conversion to aligned gold nanowires, metallic nanowire dielectric silica nanoparticle in form line-dot nanostructures. smallest patterns have half-pitch small 9.8 nm. In all cases, soft-shear achieved using high-molecular-mass polymer topcoat layer, support on neutral bottom layer. also show that red-shifted plasmonic response comparison neat nanowires. These BCPs nanowires potential use nanopatterning applications, should be useful sensing biomolecules other molecular species based