Correlation between Growth Conditions, Microstructure, and Optical Properties in Pulsed-Laser-Deposited V2O5 Thin Films

• DOI: 10.1021/cm048507m
• Publication Date: 2005-03-01T05:31:34Z
• Authors: C. V. Ramana; R. J. Smith; O. M. Hussain; C. C. Chusuei; C. M. Julien
• Keywords: Rutherford backscattering spectrometry; Pulsed Laser Deposition

V2O5 thin films were prepared by pulsed laser deposition (PLD) over a wide substrate temperature range, 30−500 °C, and characterized studying their microstructure optical properties. Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), UV−vis−NIR spectral measurements made on the PLD to understand effect of chemical composition, elemental distribution, surface morphology, The strongly influences structure properties correlation exists between growth conditions, grain structure, characteristics. size increased, associated with change in increasing temperature. energy band gap is dependent decreased from 2.47 2.12 eV increase 30 500 °C.