Atomic Layer Deposition and in Situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide

• DOI: 10.1021/jp509298r
• Publication Date: 2014-11-06T06:22:00Z
• Authors: Alexander C. Kozen; Alexander J. Pearse; Chuan-Fu Lin; Marshall A. Schro...; Malachi Noked; Sang Bok Lee; Gary W. Rubloff
• Keywords: Lithium hydroxide; Lithium hydride; Volatilisation; Lithium oxide

We demonstrate the ultraclean atomic layer deposition (ALD) of Li2O and LiOH using lithium tert-butoxide (LiOtBu) precursor with H2O plasma O2 as oxidants, along conversion products to Li2CO3 upon CO2 dosing. Using LiOtBu results in below 240 °C above for otherwise identical process parameters. Substituting oxidation a combination products, indicating modification ALD reaction preventing volatilization C from Li precursor. The chemistry films is definitively characterized first time XPS utilizing an all-UHV transfer procedure reactor. use situ UHV gas dosing investigate mechanisms simulate reactions air exposure. Lastly, we employ spectroscopic ellipsometry determine kinetics thermal decomposition, report activation energy 112.7 ± 0.6 kJ/mol.