UV Photoactivated Room Temperature CVD of Aluminum on Functionalized Self-Assembled Monolayers Adsorbed on Au

• DOI: 10.1021/la303454d
• Publication Date: 2012-11-12T19:21:02Z
• Authors: Zhiwei Shi; Peng Lu; Amy V. Walker
• Keywords: Self-assembled monolayer; Deposition

We have investigated the selective photoactivated room temperature chemical vapor deposition (CVD) of aluminum (Al) on functionalized self-assembled monolayers adsorbed Au. The CVD precursor employed is trimethyl (TMA). Using a deuterium arc lamp we demonstrate that rate Al film growth approximately twice observed for nonphotoactivated using TMA. At wavelengths employed, photolysis TMA leads to dissociation dimer its monomer followed by successive release methyl groups form (CH(3))(3-x)Al. photogenerated (CH(3))(3-x)Al species react with -OH- and -COOH-terminated SAMs but not -CH(3)-terminated SAMs. these reactions can be selectively deposited -CH(3)/-COOH-patterned possible reaction mechanisms involved in are discussed. These results indicate (laser CVD) processes suitable stable films metals other materials organic films.