Subwavelength Direct Laser Patterning of Conductive Gold Nanostructures by Simultaneous Photopolymerization and Photoreduction

• DOI: 10.1021/nn103015g
• Publication Date: 2011-03-02T17:44:16Z
• Authors: Shobha Shukla; Xavier Vidal; Edward P. Furlani; Mark T. Swihart; Kyoung-Tae Kim; Yong-Kyu Yoon; Augustine Urbas; Paras N. Prasad
• Keywords: Photoresist

This article presents a new method for fabricating highly conductive gold nanostructures within polymeric matrix with subwavelength resolution. The are directly written in precursor-doped photoresist using femtosecond pulsed laser. laser energy is absorbed by two-photon dye, which induces simultaneous reduction of the precursor and polymerization negative photoresist. results nanoparticle-doped lines that exhibit both plasmonic effects, due to constituent nanoparticles, relatively high conductivity (within an order magnitude bulk metal), density particles these lines. Line widths from 150 1000 nm have been achieved this method. Various optically functional structures prepared, their structural optical properties characterized. influence intensity scan speed on feature size studied found be agreement predictions mathematical model process.