Nano-seeding catalysts for high-density arrays of horizontally aligned carbon nanotubes with wafer-scale uniformity

• DOI: 10.1038/s41467-024-55515-0
• Publication Date: 2025-01-03T01:47:43Z
• Authors: Ying Xie; Yue Li; Zhisheng Peng; Chengyu Wang; Zanlin Qiu; Xinyi Cai; Tinglu Song; Jia Si; Xiaoxu Zhao; Liu Qian; Ziqiang Zhao; Jin Zhang
• Keywords: Science; Q; Article

In the realm of modern materials science, horizontally aligned carbon nanotube arrays stand as promising for development next-generation integrated circuits. However, their large-scale integration has been impeded by constraints current fabrication techniques, which struggle to achieve necessary uniformity, density, and size control arrays. Overcoming this challenge necessitates a significant shift in approaches. Herein, we present nano-seeding method that revolutionized preparation catalyst nanoparticles, crucial carbon-nanotube-array synthesis. Our approach, underpinned ion implantation substrate processing, allows precise over formation. Further vertical spraying chemical vapor deposition system homogenizes gas flow ensures uniform growth This culminates direct one-inch wafers with highest density 140 tubes μm−1. The high uniformity as-prepared are validated through an advanced high-throughput characterization technique. electrical properties on-state current, on/off ratio low subthreshold swing demonstrated field-effect transistors based on study propels scalability future carbon-based electronics. Arrays nanotubes candidates Here, authors enables such up per μm.